Nano plating. Part II - Preparation hard magnetic film FePt on n-Si layer.
Abstract
FePt thin films are used as hard magnetic materials of high density in data storage and recording media as well as in microelectromechanical systems (MEMS). The film layers call be range from submicron to nm-range thickness. There are many expensive procedures to deposit and integrate magnetic materials into electronic processing systems such as sputtering, epitaxy etc but the increasing demands for the development of cost-effective processes are atways a problem of today. Pulse plating is well-known as powerful techniques recently succeed in the electrodeposition of nanostructured magnetic films - so called "nanoptating", which can he compatible with other vacuum or vapor deposition techniques. In this paper, we show the electrodeposition film from a single electrolyte containing Fe2+ and Pt4+ that can be controlled exactly by pulse plating parameters. The magnetic properties of obtained films have been examined in dependence on the film composition, film thickness as well as annealing conditions. By heat treatment (550 - 650oC), the transition from fcc-FePt to fct-FePt was observed and has resulted in the increasing the coercivity.